APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE
PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas t...
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| creator | REES M REYNOLDS HELMS JR AUBREY LYNN JOHNSON JAMES TYKE LUCAS JR H WILLIAM |
| description | PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas to be transported to a gas processing apparatus. A door seal and inert gas purification system ensure the furnace actuates safely and minimize reaction of the process gas at a door seal region. The exhaust system comprises a processing tube having a first end portion, a second end portion and an external surface between the first end portion and the second end portion, a first engagement surface located on an external surface of the first end portion, and a rip that is a door engaging with the first end portion of the processing tube and forming a concave cavity to which the first end portion of the processing tube is inserted, a second engagement surface that engages with a first engagement surface of the processing tube at a predetermined angle with respect to the longitudinal axis of the processing tube and located on the inner surface of the rip, and an exhaust pipe that penetrates the second end portion of the processing tube. |
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A door seal and inert gas purification system ensure the furnace actuates safely and minimize reaction of the process gas at a door seal region. The exhaust system comprises a processing tube having a first end portion, a second end portion and an external surface between the first end portion and the second end portion, a first engagement surface located on an external surface of the first end portion, and a rip that is a door engaging with the first end portion of the processing tube and forming a concave cavity to which the first end portion of the processing tube is inserted, a second engagement surface that engages with a first engagement surface of the processing tube at a predetermined angle with respect to the longitudinal axis of the processing tube and located on the inner surface of the rip, and an exhaust pipe that penetrates the second end portion of the processing tube.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120510&DB=EPODOC&CC=JP&NR=2012089850A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120510&DB=EPODOC&CC=JP&NR=2012089850A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>REES M REYNOLDS</creatorcontrib><creatorcontrib>HELMS JR AUBREY LYNN</creatorcontrib><creatorcontrib>JOHNSON JAMES TYKE</creatorcontrib><creatorcontrib>LUCAS JR H WILLIAM</creatorcontrib><title>APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE</title><description>PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas to be transported to a gas processing apparatus. A door seal and inert gas purification system ensure the furnace actuates safely and minimize reaction of the process gas at a door seal region. The exhaust system comprises a processing tube having a first end portion, a second end portion and an external surface between the first end portion and the second end portion, a first engagement surface located on an external surface of the first end portion, and a rip that is a door engaging with the first end portion of the processing tube and forming a concave cavity to which the first end portion of the processing tube is inserted, a second engagement surface that engages with a first engagement surface of the processing tube at a predetermined angle with respect to the longitudinal axis of the processing tube and located on the inner surface of the rip, and an exhaust pipe that penetrates the second end portion of the processing tube.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB0DAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9SCA4NcnN0dlUICXJ1DPF19QtRCPcM8fD0U3ALDfIDSvAwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknivACMDQyMDC0sLUwNHY6IUAQDd9Sk6</recordid><startdate>20120510</startdate><enddate>20120510</enddate><creator>REES M REYNOLDS</creator><creator>HELMS JR AUBREY LYNN</creator><creator>JOHNSON JAMES TYKE</creator><creator>LUCAS JR H WILLIAM</creator><scope>EVB</scope></search><sort><creationdate>20120510</creationdate><title>APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE</title><author>REES M REYNOLDS ; HELMS JR AUBREY LYNN ; JOHNSON JAMES TYKE ; LUCAS JR H WILLIAM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2012089850A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>REES M REYNOLDS</creatorcontrib><creatorcontrib>HELMS JR AUBREY LYNN</creatorcontrib><creatorcontrib>JOHNSON JAMES TYKE</creatorcontrib><creatorcontrib>LUCAS JR H WILLIAM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>REES M REYNOLDS</au><au>HELMS JR AUBREY LYNN</au><au>JOHNSON JAMES TYKE</au><au>LUCAS JR H WILLIAM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE</title><date>2012-05-10</date><risdate>2012</risdate><abstract>PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas to be transported to a gas processing apparatus. A door seal and inert gas purification system ensure the furnace actuates safely and minimize reaction of the process gas at a door seal region. The exhaust system comprises a processing tube having a first end portion, a second end portion and an external surface between the first end portion and the second end portion, a first engagement surface located on an external surface of the first end portion, and a rip that is a door engaging with the first end portion of the processing tube and forming a concave cavity to which the first end portion of the processing tube is inserted, a second engagement surface that engages with a first engagement surface of the processing tube at a predetermined angle with respect to the longitudinal axis of the processing tube and located on the inner surface of the rip, and an exhaust pipe that penetrates the second end portion of the processing tube.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE |
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