APPARATUS AND METHOD FOR SURFACE TREATMENT WITHIN FURNACE

PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas t...

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Hauptverfasser: REES M REYNOLDS, HELMS JR AUBREY LYNN, JOHNSON JAMES TYKE, LUCAS JR H WILLIAM
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an apparatus and a method for processing the surface of a substrate in a furnace with improved precipitation of a thin layer as well as the reaction between gas-phase components and the surface.SOLUTION: An exhaust system and a method therefor causes an exhaust gas to be transported to a gas processing apparatus. A door seal and inert gas purification system ensure the furnace actuates safely and minimize reaction of the process gas at a door seal region. The exhaust system comprises a processing tube having a first end portion, a second end portion and an external surface between the first end portion and the second end portion, a first engagement surface located on an external surface of the first end portion, and a rip that is a door engaging with the first end portion of the processing tube and forming a concave cavity to which the first end portion of the processing tube is inserted, a second engagement surface that engages with a first engagement surface of the processing tube at a predetermined angle with respect to the longitudinal axis of the processing tube and located on the inner surface of the rip, and an exhaust pipe that penetrates the second end portion of the processing tube.