EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE

PROBLEM TO BE SOLVED: To improve drawing accuracy by correcting variation in an exposure amount due to deformation of an optical component included in a radiation optical system.SOLUTION: According to deformation of an optical component included in the radiation optical system of a light beam radiat...

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Bibliographische Detailangaben
Hauptverfasser: UEHARA SATOSHI, MOCHIZUKI MASAAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve drawing accuracy by correcting variation in an exposure amount due to deformation of an optical component included in a radiation optical system.SOLUTION: According to deformation of an optical component included in the radiation optical system of a light beam radiating device, a drawing controls part 71 corrects drawing data so that area radiated with light beam narrows or expands and supplies them to driving circuits of the light beam radiating device. A first memory 76a stores data specifying a position for narrowing an area to be radiated with a light beam. A second memory 76b stores data specifying a position for expanding area to be radiated with a light beam. A conversion circuit 77a converts drawing data according to data stored in a first memory. A conversion circuit 77b converts drawing data according to data stored in the second memory. A selection circuit 78 selects any one of the drawing data converted by the conversion circuit 77a, drawing data converted by the conversion circuit 77b, or drawing data before the conversion.