COMPOSITION FOR PRODUCTION OF ZINC OXIDE THIN FILM AND COMPOSITION FOR PRODUCTION OF DOPED ZINC OXIDE THIN FILM

COMPOSITION FOR PRODUCTION OF ZINC OXIDE THIN FILM AND COMPOSITION FOR PRODUCTION OF DOPED ZINC OXIDE THIN FILM

PROBLEM TO BE SOLVED: To provide a composition for production of zinc oxide thin films, which uses an organozinc compound as a starting material, is easily handled because of no ignitability, and can form transparent zinc oxide thin films and group 3B element-doped zinc oxide thin films by heating a...

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Bibliographische Detailangaben
Hauptverfasser: HAGA KENICHI, TOKUTOME KOICHI, INABA KOICHIRO, TOYODA KOJI
Format: Patent
Sprache:eng
Schlagworte:
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
INORGANIC CHEMISTRY
METALLURGY
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a composition for production of zinc oxide thin films, which uses an organozinc compound as a starting material, is easily handled because of no ignitability, and can form transparent zinc oxide thin films and group 3B element-doped zinc oxide thin films by heating at ≤300°C.SOLUTION: The composition for the production of zinc oxide thin films contains the partial hydrolysis product of an organozinc compound. The amount of water added is 0.05 to