SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which only a substrate processing region on one face of a substrate to be processed can be easily and quickly processed using a substrate treatment solution.SOLUTION: In a substrate processing apparatus 100, substrate treatment liquid TL can be supplied only to a substrate processing region TS on a substrate PB to be processed by, for example, immersing a substrate holding member 110, to which the substrate PB to be processed is set, into the substrate treatment liquid TL in the substrate processing region TS, the substrate treatment liquid being accommodated in a solution holding container 130.