EXPOSURE DEVICE, MAINTENANCE METHOD, AND MANUFACTURING METHOD OF DEVICE

PROBLEM TO BE SOLVED: To provide a maintenance method capable of minimizing occurrence of poor exposure.SOLUTION: The maintenance method of an exposure device which exposes a substrate with exposure light emitted from the emission surface of an optical member through a liquid includes a step for sup...

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Bibliographische Detailangaben

1. Verfasser:	HOSHIKA RYUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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