EXPOSURE DEVICE, MAINTENANCE METHOD, AND MANUFACTURING METHOD OF DEVICE

PROBLEM TO BE SOLVED: To provide a maintenance method capable of minimizing occurrence of poor exposure.SOLUTION: The maintenance method of an exposure device which exposes a substrate with exposure light emitted from the emission surface of an optical member through a liquid includes a step for sup...

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Bibliographische Detailangaben
1. Verfasser:	HOSHIKA RYUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a maintenance method capable of minimizing occurrence of poor exposure.SOLUTION: The maintenance method of an exposure device which exposes a substrate with exposure light emitted from the emission surface of an optical member through a liquid includes a step for supplying a second liquid having a prescribed gas concentration higher than that of a first liquid to the surface of a film containing an amorphous fluororesin that is irradiated with exposure light from the emission surface through a first liquid subjected to deaeration, and a step for irradiating the film surface with ultraviolet light through the second liquid.