ION SOURCE, SYSTEM AND METHOD

ION SOURCE, SYSTEM AND METHOD

PROBLEM TO BE SOLVED: To achieve an ion beam with a spot size of 10 nm or less on a sample surface in an ion microscope using a gas field ion source.SOLUTION: A material and shape of a conductive electrode tip 186 of an ion source is optimized so that an atomic layer of a trimer is formed on a tip s...

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Bibliographische Detailangaben
Hauptverfasser: LEWIS S FALKUS III, JOHN A NOTTE IV, RANDOLPH G PERCIVAL, RAYMOND HILL, ALEXANDER GROKHOLSKY, BILLY W WARD, RICHARD COMUNALE
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Zusammenfassung:PROBLEM TO BE SOLVED: To achieve an ion beam with a spot size of 10 nm or less on a sample surface in an ion microscope using a gas field ion source.SOLUTION: A material and shape of a conductive electrode tip 186 of an ion source is optimized so that an atomic layer of a trimer is formed on a tip surface, and the ion source is operated in ultralow temperature conditions. Thereby, ionization efficiency with vaporized helium is improved. A spot of 10 nm or less on a sample 180 can be achieved by selecting a movement mechanism 208 for the electrode tip and a diameter 224 of an aperture opening to control a beam diameter and current amount.