PHOTOCATALYST STRUCTURE, AND PHOTOCATALYTIC FUNCTIONAL PRODUCT USING THE SAME

PROBLEM TO BE SOLVED: To provide a photocatalyst structure reduced in brittleness and easy separation of a photocatalyst layer, and capable of restraining photocatalytic performance from being deteriorated by a long period of light irradiation.SOLUTION: The photocatalyst structure includes a resin b...

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Bibliographische Detailangaben
Hauptverfasser: TAKAMI HITOSHI, SAKATANI YOSHIAKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photocatalyst structure reduced in brittleness and easy separation of a photocatalyst layer, and capable of restraining photocatalytic performance from being deteriorated by a long period of light irradiation.SOLUTION: The photocatalyst structure includes a resin base material, an inorganic oxide layer laminated on a face of the resin base material, and the photocatalyst layer laminated on a face of the inorganic oxide layer, the layer thickness of the inorganic oxide layer is 110-190 nm, and the layer thickness of the photocatalyst layer is 60-500 nm. The inorganic oxide layer is preferably manufactured by a vacuum deposition method, a spattering method, an ionization vapor deposition method, an ion beam method, or a chemical vapor phase deposition method.