LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide an immersion liquid containing one or more additives for solving the problem of stain appearance when drying areas wetted by the liquid in immersion exposure.SOLUTION: A device manufacturing method includes adding a component having a vapor pressure greater than 0.1 IcPa to a liquid and exposing a photosensitive substrate to radiation, in which the radiation passes through the aqueous liquid containing the component before reaching the photosensitive substrate. Since the addition of the component increases an ion concentration in the liquid, the immersion liquid is provided containing an ion-forming component, e.g. an acid or a base having a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.