LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was forme...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HAYASE FUMIO, MIZUNO TSUYOSHI, NANBA HIROMITSU, HISHIYA SHINGO, HARADA TAKESHIGE, MOROZUMI YUICHIRO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator HAYASE FUMIO
MIZUNO TSUYOSHI
NANBA HIROMITSU
HISHIYA SHINGO
HARADA TAKESHIGE
MOROZUMI YUICHIRO
description PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was formed on the surface and back of the substrate.SOLUTION: A liquid processing method for processing the back of the substrate with a processing liquid includes a first step S11 of supporting a substrate on which the titanium-containing film is formed on the surface and back of the substrate by the support part which is provided rotatably and supports the substrate, rotating the substrate supported by the support part together with the support part, supplying a first processing liquid including ammonia hyperhydration to the back of a rotating substrate, and processing the back of the substrate with the supplied first processing liquid.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2012064893A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2012064893A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2012064893A3</originalsourceid><addsrcrecordid>eNrjZCjy8QwM9XRRCAjyd3YNDvb0c1fwdQ3x8HfRUQhydfYPcoGIuHiG-ioEh_gHgbhAte5Bjr4Kbv5BCq4Rrs6hISDREA9XhWBHX1cdBUc_FwVMYx0DAhyDHENCg3kYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBoZGBmYmFpbGjMVGKAMgnOPA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS</title><source>esp@cenet</source><creator>HAYASE FUMIO ; MIZUNO TSUYOSHI ; NANBA HIROMITSU ; HISHIYA SHINGO ; HARADA TAKESHIGE ; MOROZUMI YUICHIRO</creator><creatorcontrib>HAYASE FUMIO ; MIZUNO TSUYOSHI ; NANBA HIROMITSU ; HISHIYA SHINGO ; HARADA TAKESHIGE ; MOROZUMI YUICHIRO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was formed on the surface and back of the substrate.SOLUTION: A liquid processing method for processing the back of the substrate with a processing liquid includes a first step S11 of supporting a substrate on which the titanium-containing film is formed on the surface and back of the substrate by the support part which is provided rotatably and supports the substrate, rotating the substrate supported by the support part together with the support part, supplying a first processing liquid including ammonia hyperhydration to the back of a rotating substrate, and processing the back of the substrate with the supplied first processing liquid.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120329&amp;DB=EPODOC&amp;CC=JP&amp;NR=2012064893A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120329&amp;DB=EPODOC&amp;CC=JP&amp;NR=2012064893A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAYASE FUMIO</creatorcontrib><creatorcontrib>MIZUNO TSUYOSHI</creatorcontrib><creatorcontrib>NANBA HIROMITSU</creatorcontrib><creatorcontrib>HISHIYA SHINGO</creatorcontrib><creatorcontrib>HARADA TAKESHIGE</creatorcontrib><creatorcontrib>MOROZUMI YUICHIRO</creatorcontrib><title>LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was formed on the surface and back of the substrate.SOLUTION: A liquid processing method for processing the back of the substrate with a processing liquid includes a first step S11 of supporting a substrate on which the titanium-containing film is formed on the surface and back of the substrate by the support part which is provided rotatably and supports the substrate, rotating the substrate supported by the support part together with the support part, supplying a first processing liquid including ammonia hyperhydration to the back of a rotating substrate, and processing the back of the substrate with the supplied first processing liquid.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZCjy8QwM9XRRCAjyd3YNDvb0c1fwdQ3x8HfRUQhydfYPcoGIuHiG-ioEh_gHgbhAte5Bjr4Kbv5BCq4Rrs6hISDREA9XhWBHX1cdBUc_FwVMYx0DAhyDHENCg3kYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBoZGBmYmFpbGjMVGKAMgnOPA</recordid><startdate>20120329</startdate><enddate>20120329</enddate><creator>HAYASE FUMIO</creator><creator>MIZUNO TSUYOSHI</creator><creator>NANBA HIROMITSU</creator><creator>HISHIYA SHINGO</creator><creator>HARADA TAKESHIGE</creator><creator>MOROZUMI YUICHIRO</creator><scope>EVB</scope></search><sort><creationdate>20120329</creationdate><title>LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS</title><author>HAYASE FUMIO ; MIZUNO TSUYOSHI ; NANBA HIROMITSU ; HISHIYA SHINGO ; HARADA TAKESHIGE ; MOROZUMI YUICHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2012064893A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>HAYASE FUMIO</creatorcontrib><creatorcontrib>MIZUNO TSUYOSHI</creatorcontrib><creatorcontrib>NANBA HIROMITSU</creatorcontrib><creatorcontrib>HISHIYA SHINGO</creatorcontrib><creatorcontrib>HARADA TAKESHIGE</creatorcontrib><creatorcontrib>MOROZUMI YUICHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAYASE FUMIO</au><au>MIZUNO TSUYOSHI</au><au>NANBA HIROMITSU</au><au>HISHIYA SHINGO</au><au>HARADA TAKESHIGE</au><au>MOROZUMI YUICHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS</title><date>2012-03-29</date><risdate>2012</risdate><abstract>PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was formed on the surface and back of the substrate.SOLUTION: A liquid processing method for processing the back of the substrate with a processing liquid includes a first step S11 of supporting a substrate on which the titanium-containing film is formed on the surface and back of the substrate by the support part which is provided rotatably and supports the substrate, rotating the substrate supported by the support part together with the support part, supplying a first processing liquid including ammonia hyperhydration to the back of a rotating substrate, and processing the back of the substrate with the supplied first processing liquid.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2012064893A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T16%3A03%3A46IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAYASE%20FUMIO&rft.date=2012-03-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2012064893A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true