LIQUID PROCESSING METHOD, RECORDING MEDIUM STORING PROGRAM FOR EXECUTING THE SAME, AND LIQUID PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was forme...

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Bibliographische Detailangaben
Hauptverfasser:	HAYASE FUMIO, MIZUNO TSUYOSHI, NANBA HIROMITSU, HISHIYA SHINGO, HARADA TAKESHIGE, MOROZUMI YUICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a liquid processing method capable of removing a titanium element remaining on the back of a substrate in a shorter time than the conventional time when removing a titanium-containing film from the back of the substrate on which the titanium-containing film was formed on the surface and back of the substrate.SOLUTION: A liquid processing method for processing the back of the substrate with a processing liquid includes a first step S11 of supporting a substrate on which the titanium-containing film is formed on the surface and back of the substrate by the support part which is provided rotatably and supports the substrate, rotating the substrate supported by the support part together with the support part, supplying a first processing liquid including ammonia hyperhydration to the back of a rotating substrate, and processing the back of the substrate with the supplied first processing liquid.