METHOD AND APPARATUS FOR FORMING DEPOSITED FILM

PROBLEM TO BE SOLVED: To provide a method for forming deposited films that efficiently prevents dust from adhering to a substrate when the substrate is transferred from a carrier into a treatment chamber via a gate valve to thereby improve the quality of deposited films, and in which productivity is...

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Bibliographische Detailangaben
Hauptverfasser:	OHIRA JUN, HOSOI KAZUTO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MAGNETOGRAPHY METALLURGY PHOTOGRAPHY PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for forming deposited films that efficiently prevents dust from adhering to a substrate when the substrate is transferred from a carrier into a treatment chamber via a gate valve to thereby improve the quality of deposited films, and in which productivity is superior, and to provide an apparatus for forming deposited films.SOLUTION: Two valve bodies are regarded as a first valve body 123 and a second valve body 124, which are defined in order from a container side that the treatment chamber 160 and/or the carrier 120 have. The first valve body is closed completely when the treatment chamber and the carrier are not connected and the treatment chamber has only one valve body. At least the second valve body is closed completely when the treatment chamber has two valve bodies. The first valve body is closed completely when the carrier has only one valve body, and the second valve body is at least closed completely when the carrier has two valve bodies. An exhaust process is conducted with the first valve body completely closed and the second valve body completely opened.