CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD

PROBLEM TO BE SOLVED: To provide a charged particle beam device for processing and observing a sample by irradiating the sample with both an ion beam and an electron beam, which includes a common detector for both the ion beam and the electron beam, and in which the detector can be provided at a suitable position in accordance with details of processing on the sample and an observation technique.SOLUTION: A charged particle beam device includes an electron beam optical system column which generates an electron beam for observing an observation surface of a sample, an ion beam optical system column which generates an ion beam for processing the sample, a detector which detects a secondary signal or a transmitted electron generated by the sample, and a sample stage on which the detector is mounted and which can rotate on a cross point where an optical axis of the electron beam and an optical axis of the ion beam cross each other and in a plane containing both the optical axes, and can vary the distance between the observation surface of the sample and the cross point.