RESIST PATTERN FORMATION METHOD

PROBLEM TO BE SOLVED: To provide a resist pattern formation method for forming a resist pattern having higher adhesion with a supporting body with a method simpler than before.SOLUTION: The resist pattern formation method includes a step (1) for coating a resist composition on a substrate directly,...

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Bibliographische Detailangaben

Hauptverfasser:	MATSUMIYA YU, DAZAI NAOHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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