EXPOSURE DEVICE AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To control the temperature of a reticle.SOLUTION: A temperature controller assembly 86 is levitated above a reticle R without contact by using a gas hydrostatic bearing 86provided in a block 86via a prescribed clearance to the reticle R, and a temperature controller 86a is brou...

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Bibliographische Detailangaben
1. Verfasser:	YOSHIMOTO HIROMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To control the temperature of a reticle.SOLUTION: A temperature controller assembly 86 is levitated above a reticle R without contact by using a gas hydrostatic bearing 86provided in a block 86via a prescribed clearance to the reticle R, and a temperature controller 86a is brought close to the surface of the reticle R. Consequently, temperature of the reticle R can be controlled while avoiding damage on the reticle R due to the contact with the temperature controller 86a. Since the temperature controller 86a has a temperature control surface which can face all surfaces of the reticle R, temperature of all surfaces of the reticle R can be controlled at once.