CHARGED PARTICLE BEAM APPARATUS, DEFECT OBSERVATION DEVICE AND ADMINISTRATIVE SERVER

PROBLEM TO BE SOLVED: To provide a charged particle beam apparatus preventing an increase of process troubles caused by a deterioration of review performance such as nondetection of failure, by detecting failure or possible failure of operation affecting apparatus performance during a processing sequence of samples, and by feeding it back in real time.SOLUTION: In individual processing steps of a charged particle beam apparatus, monitoring items representing an operation state of the apparatus such as a control state of an electron beam, an offset amount in wafer positioning, and a defect coordinate error offset amount are monitored in a processing sequence of samples, and are stored as history information. Moreover, Values of the monitoring items are compared with the past history information corresponding to the monitoring items to make determination based on preset criteria in the middle of the processing sequence. When a fluctuation margin from the past history information is beyond a reference range, an alert is generated.