POWER SUPPLY APPARATUS FOR GENERATING CONTINUOUS PLASMA IN LIQUID

PROBLEM TO BE SOLVED: To provide a power supply apparatus capable of continuously applying a repetitive high-power and high-voltage pulse with higher frequency to use continuous plasma in liquid to allow efficiency of a chemical reaction to be improved.SOLUTION: A power supply apparatus continuously...

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Bibliographische Detailangaben
Hauptverfasser: HISHIDA SIGEJI, TAKAI OSAMU, SAITO NAGAHIRO, NISHIMURA YOSHIMI, KAKITANI SHINICHI, SHIRAFUJI RITSU, HIEDA JUNKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a power supply apparatus capable of continuously applying a repetitive high-power and high-voltage pulse with higher frequency to use continuous plasma in liquid to allow efficiency of a chemical reaction to be improved.SOLUTION: A power supply apparatus continuously applies a repetitive high-power and high-voltage pulse with higher frequency to electrodes disposed in a solution to generate plasma in the vicinity of the electrodes to thereby improve efficiency of a chemical reaction of the plasma at a gas-liquid interface in the solution. In the apparatus, a divided frequency and phase control circuit 3 of an IGBT driver 18 generates first, second and third switching signals with a phase shifted by a 1/3 period, and outputs the first, second and third switching signals to first, second and third switching circuits 11, 12, and 13 of first, second and third modulator power supplies 4, 5, and 6, respectively, to allow the respective switching circuits to perform a switching operation and to generate power-amplified first, second and third pulse voltages. A pulse voltage formed by combining the first, second and third pulse voltages is inputted to a pulse transformer 15.