CHEMICAL FEED SYSTEM

PROBLEM TO BE SOLVED: To provide a technology for measuring a flow rate of a diaphragm pump.SOLUTION: A chemical feed system is provided for calculating at least one of a sucked amount and a discharged amount of a chemical based on a flow rate of a working gas. The chemical feed system includes: a p...

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Bibliographische Detailangaben
Hauptverfasser:	SAKAI ATSUYUKI, YOSHIDA MASATERU, TOYODA TETSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING HEATING LIGHTING MECHANICAL ENGINEERING POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS PUMPS PUMPS FOR LIQUIDS OR ELASTIC FLUIDS WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technology for measuring a flow rate of a diaphragm pump.SOLUTION: A chemical feed system is provided for calculating at least one of a sucked amount and a discharged amount of a chemical based on a flow rate of a working gas. The chemical feed system includes: a pump body having an internal space formed to communicate with a chemical sucking port 21b and a chemical discharging port 21c; a pump 13 having a diaphragm for partitioning into a pump chamber on a side communicating with the chemical sucking port and the chemical discharging port, and a working chamber on a side communicating with a working gas supply port; a pump driving part 59 for supplying the working gas to the working gas supply port; a control part for sucking and discharging the chemical by operating the chemical sucking port, the chemical discharging port, and the pump driving part; and a gas flow rate measuring part for measuring the flow rate of the working gas.