TRANSPARENT CONDUCTIVE FILM, MANUFACTURING METHOD THEREOF, AND TOUCH PANEL

PROBLEM TO BE SOLVED: To provide a transparent conductive film in which cracking and peeling do not easily occur, a manufacturing method thereof, and a touch panel.SOLUTION: The transparent conductive film 1 includes: a base material film 11 made of transparent resin; a first metal oxide layer 12 fo...

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Bibliographische Detailangaben
Hauptverfasser:	KOIDE NORIKATSU, OKADA TAKATETSU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CALCULATING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPUTING CONDUCTORS COUNTING DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DIGITAL DATA PROCESSING ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS METALLURGY PHYSICS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a transparent conductive film in which cracking and peeling do not easily occur, a manufacturing method thereof, and a touch panel.SOLUTION: The transparent conductive film 1 includes: a base material film 11 made of transparent resin; a first metal oxide layer 12 formed on the surface of the base material film 11, whose refractive index is higher than that of alumina; an alumina layer 13 made of alumina, formed directly on the surface of the first metal oxide layer 12; a second metal oxide layer 14 formed directly on the surface of the alumina layer 13, whose refractive index is lower than that of alumina; and a transparent conductive layer 15 formed in such a manner as to interpose the first metal oxide layer 12, the alumina layer 13 and the second metal oxide layer 14 between this layer and the base material film 11.