MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR DESIGNING OPTICAL SURFACE

MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR DESIGNING OPTICAL SURFACE

PROBLEM TO BE SOLVED: To improve an optical system which can be used as a projection objective in a microlithography projection exposure apparatus with respect to resolution at an illumination wavelength.SOLUTION: A microlithography projection optical system 101 includes a plurality of elements whic...

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Hauptverfasser: MUANG HANS JURGEN, MARCO PRETORIUS, JULICH WILHELM
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Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
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creator MUANG HANS JURGEN
MARCO PRETORIUS
JULICH WILHELM
description PROBLEM TO BE SOLVED: To improve an optical system which can be used as a projection objective in a microlithography projection exposure apparatus with respect to resolution at an illumination wavelength.SOLUTION: A microlithography projection optical system 101 includes a plurality of elements which are arranged so as to form an image of radiation light from an object plane 103 to an image plane 102, where at least one of these elements is a reflecting element which is located in a path of radiation light ad has a rotational asymmetrical surface. The rotational asymmetrical surface is deviated from a rotational symmetrical surface by approximately 10 nm or more.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
title MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR DESIGNING OPTICAL SURFACE
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