MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR DESIGNING OPTICAL SURFACE

PROBLEM TO BE SOLVED: To improve an optical system which can be used as a projection objective in a microlithography projection exposure apparatus with respect to resolution at an illumination wavelength.SOLUTION: A microlithography projection optical system 101 includes a plurality of elements whic...

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Bibliographische Detailangaben
Hauptverfasser:	MUANG HANS JURGEN, MARCO PRETORIUS, JULICH WILHELM
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve an optical system which can be used as a projection objective in a microlithography projection exposure apparatus with respect to resolution at an illumination wavelength.SOLUTION: A microlithography projection optical system 101 includes a plurality of elements which are arranged so as to form an image of radiation light from an object plane 103 to an image plane 102, where at least one of these elements is a reflecting element which is located in a path of radiation light ad has a rotational asymmetrical surface. The rotational asymmetrical surface is deviated from a rotational symmetrical surface by approximately 10 nm or more.