POSITIVE PHOTOSENSITIVE RESIN COMPOSITION

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition showing good resolution, and good electric insulation characteristics and strength in a cured product thereof.SOLUTION: A positive photosensitive resin composition contains (A) an alkali soluble resin having a phenolic hydr...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	ISHIKAWA KAORU, ANDO TOMOYUKI, SENZAKI TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition showing good resolution, and good electric insulation characteristics and strength in a cured product thereof.SOLUTION: A positive photosensitive resin composition contains (A) an alkali soluble resin having a phenolic hydroxy group, (B) a compound having a quinonediazide group, (C) a compound having at least two alkyl-etherified amino groups in the molecule, (D) an acrylic resin comprising a constitutional unit (d1) represented by the following general formula (1) and a constitutional unit (d2) derived from an unsaturated carboxylic acid and having a mass-average molecular weight of 20,000 to 500,000, and (S) a solvent. In the general formula (1), Rrepresents a hydrogen atom or an alkyl group, Rindependently represents a hydrocarbon group, and p represent 0 to 3.