MOLD FOR NANOIMPRINT

PROBLEM TO BE SOLVED: To provide a mold for nanoimprint having superior mold releasability with a workpiece after optical imprint.SOLUTION: The mold 1 for the nanoimprint includes: a base material 2 having a base 3 and a convex structure 4 protruding from one surface of the base 3; a transfer shape...

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Bibliographische Detailangaben
Hauptverfasser:	HOGEN MORIHISA, ARITSUKA YUKI, YAMADA TOMOKO, HIRABAYASHI MASASHI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a mold for nanoimprint having superior mold releasability with a workpiece after optical imprint.SOLUTION: The mold 1 for the nanoimprint includes: a base material 2 having a base 3 and a convex structure 4 protruding from one surface of the base 3; a transfer shape part 5 positioned on the top 4a of the convex structure 4; and a slope 6 positioned on an entire circumferential area of the side 4b of the convex structure 4.