STATIC ELIMINATOR OF WAFER AND STATIC ELIMINATION METHOD OF WAFER

STATIC ELIMINATOR OF WAFER AND STATIC ELIMINATION METHOD OF WAFER

PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface.SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an io...

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Bibliographische Detailangaben
Hauptverfasser: SUGAI JUNJI, KOBAYASHI TOMOKAZU, KOMATSU KENICHI, MATSUMURA YASUHIDE
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent impurities deposited in a tip of an electrode needle of an ionizer using corona discharge from dropping on a wafer surface.SOLUTION: A static eliminator of a wafer is used. The static eliminator of a wafer includes: a cover 13 covering above a prealigner 1; and an ion supply part 14 disposed on a periphery of the cover 13 or below the periphery. An ion supply port 15 of the ion supply part 14 is arranged to face a space formed between the cover 13 and the prealigner 1.