SOLID-STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME
PROBLEM TO BE SOLVED: To provide a solid-state imaging device capable of preventing a generation of a white dot-shaped defect on a reproduction screen which is caused by a leak current due to a crystal defect.SOLUTION: A solid-state imaging device 10 comprises: a semiconductor substrate 103; a photo...
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Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a solid-state imaging device capable of preventing a generation of a white dot-shaped defect on a reproduction screen which is caused by a leak current due to a crystal defect.SOLUTION: A solid-state imaging device 10 comprises: a semiconductor substrate 103; a photodiode 110; a floating diffusion 160; and a transfer gate electrode 123. The floating diffusion 160 includes: a first impurity region 121 that is formed in a first region so as to extend from a surface of the semiconductor substrate 103 down to a first depth, and contains a first impurity of a first concentration; a second impurity region 122 that is formed in a second region farther from the transfer gate electrode 123 than the first region so as to extend from the surface of the semiconductor substrate 103 down to a second depth, and contains a second impurity of a second concentration; and a third impurity region 124 that is formed in the second region so as to extend from the surface of the semiconductor substrate 103 down to a third depth more shallow than the second depth, and contains a third impurity different from the second impurity, of a third concentration higher than the second concentration. |
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