ANALYZER AND MANUFACTURING METHOD OF ANALYZER

PROBLEM TO BE SOLVED: To provide an analyzer capable of quickly analyzing a target at low cost.SOLUTION: A recess 2 is formed in a semiconductor substrate 1 by depth etching. A sensor part 5 is a field effect device formed in the recess 2 and its electrical characteristics change in accordance with...

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Bibliographische Detailangaben
Hauptverfasser: MIYAHARA YUJI, MURAKAMI YUJI, SAKAMOTO KENJI, ISHINO SHOTARO, MIYAKE AKIRA
Format: Patent
Sprache:eng
Schlagworte:
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