ANALYZER AND MANUFACTURING METHOD OF ANALYZER

PROBLEM TO BE SOLVED: To provide an analyzer capable of quickly analyzing a target at low cost.SOLUTION: A recess 2 is formed in a semiconductor substrate 1 by depth etching. A sensor part 5 is a field effect device formed in the recess 2 and its electrical characteristics change in accordance with...

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Hauptverfasser: MIYAHARA YUJI, MURAKAMI YUJI, SAKAMOTO KENJI, ISHINO SHOTARO, MIYAKE AKIRA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an analyzer capable of quickly analyzing a target at low cost.SOLUTION: A recess 2 is formed in a semiconductor substrate 1 by depth etching. A sensor part 5 is a field effect device formed in the recess 2 and its electrical characteristics change in accordance with a reaction of a target set in a gate area to a reagent. Pump parts 6A, 6B are formed in the recess 2 to perform at least one of supply and discharge of a liquid containing a reagent to/from the sensor part 5. A cover part 3 is bonded to the semiconductor substrate 1 so as to cover the recess 2 and is provided with an inlet and an outlet for a liquid to and from the recess 2.