MEGASONIC WASHING METHOD AND WASHING APPARATUS

PROBLEM TO BE SOLVED: To provide a megasonic washing method and a washing apparatus.SOLUTION: A micro cavitation is formed in a space partitioned from a washing object by applying an electromotive force to a washing solution in megasonic as the megasonic washing method. Only stably oscillating micro...

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Hauptverfasser:	OH JONG-KEUN, KIM WON-JUNG, KIN KOEI, KO HYUNG-HO, JEON CHAN-UK, CHOI JAE-HYUCK, PARK KEUN-HWAN
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a megasonic washing method and a washing apparatus.SOLUTION: A micro cavitation is formed in a space partitioned from a washing object by applying an electromotive force to a washing solution in megasonic as the megasonic washing method. Only stably oscillating microcavitations out of the formed microcavitations are moved to the space where the washing objects are loaded. In addition, the surfaces of the washing objects are washed using the stably oscillating microcavitations. The method can prevent patterns inside the washing objects from being damaged and effectively remove particles on the surfaces of the washing objects.