SUBSTRATE SUPPORT DEVICE AND VACUUM TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate support device which contributes to high throughput by stabilizing an attitude of supporting a substrate when the substrate is transferred.SOLUTION: An end effector is to support a substrate having a center hole 9a in a vertical attitude, and has an arm m...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	GOSHOKUBO GEN, IKEDA YASUTAKA, SONE HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HAND TOOLS MANIPULATORS PERFORMING OPERATIONS PORTABLE POWER-DRIVEN TOOLS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate support device which contributes to high throughput by stabilizing an attitude of supporting a substrate when the substrate is transferred.SOLUTION: An end effector is to support a substrate having a center hole 9a in a vertical attitude, and has an arm member 6a of which the operation in an advance/retreat direction and in a vertical direction is controlled by a driving source, and a locking mechanism 6b which is mounted on the arm member 6a and supports the substrate 9. The locking mechanism 6b has a support block 8 having a recessed support groove 32 formed thereon on which the edge part of the inside of the center hole 9a can be placed, and which is opened upward. The support groove 32 can support the substrate 9 in the vertical attitude in a state in which the edge part of the inside of the center hole 9a comes in contact with four contact points 31, and thereby allowing stabilization of the attitude of supporting the substrate.