RETICLE INSPECTION DEVICE AND RETICLE INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide a device with a simple configuration for accurately detecting foreign materials such as haze in a minute level difference.SOLUTION: A reticle inspection device 100 includes a light source (laser 1, for example) for emitting irradiation light 10 that irradiates a reti...

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Bibliographische Detailangaben
1. Verfasser:	SAEKI KENICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a device with a simple configuration for accurately detecting foreign materials such as haze in a minute level difference.SOLUTION: A reticle inspection device 100 includes a light source (laser 1, for example) for emitting irradiation light 10 that irradiates a reticle 3. The reticle inspection device 100 includes an irradiation position adjusting part for adjusting an irradiation position P of the irradiation light 10 on the surface 3a of the reticle 3 and scanning the irradiation light 10 on the reticle 3, and a light receiving part (photomultiplier 8, for example) for receiving specular reflection light 11 from the surface 3a of the reticle 3. The reticle inspection device 100 includes a determination part (control part 9) for determining the presence or absence of foreign materials (such as haze) on the surface 3a of the reticle 3 based on variation in the amount of light of the specular reflection light 11 received by the light receiving part.