APPARATUS AND METHOD FOR CLEANING OF SUBSTRATE

PROBLEM TO BE SOLVED: To provide an apparatus and method for cleaning of a substrate, capable of ensuring the effect of cleaning that is uniform and good in both sides, concerning the cleaning of edges of the substrate targeted.SOLUTION: The method includes: controlling first and second on-off valve...

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Bibliographische Detailangaben
Hauptverfasser:	NAKATSUJI HACHIRO, MIMURA YOSHIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	CLEANING CLEANING IN GENERAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS PREVENTION OF FOULING IN GENERAL TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an apparatus and method for cleaning of a substrate, capable of ensuring the effect of cleaning that is uniform and good in both sides, concerning the cleaning of edges of the substrate targeted.SOLUTION: The method includes: controlling first and second on-off valves 29, 30 of first and second cleaner supply mechanisms for supplying a cleaning liquid on respective pressing surfaces of two pressing members sandwiching the edges of the substrate; and performing individual applying operation for supplying the cleaner by using two nozzles to respective pressing surfaces of both sides at a different timing that is temporally separated by a predetermined time lag specified by a predetermined interval time T3. By this arrangement, the effect of cleaning the substrate that is uniform and good in both sides can be ensured, even if using different piping from a supply tank to both sides of edges targeted for supplying the cleaner.