HYBRID PLASMA GENERATING DEVICE

PROBLEM TO BE SOLVED: To prevent the deposition of evaporated substance of a processing material such as powder on the bottom inner wall of an anode cylinder of a direct-current plasma generating body.SOLUTION: A hybrid plasma generating device comprises: a direct-current plasma generating body 1 wh...

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1. Verfasser: KOMAKI HISASHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To prevent the deposition of evaporated substance of a processing material such as powder on the bottom inner wall of an anode cylinder of a direct-current plasma generating body.SOLUTION: A hybrid plasma generating device comprises: a direct-current plasma generating body 1 which has a cathode bar 3 arranged in the center of an insulating flange 2 and an anode cylinder 5 mounted on the insulating flange 2 so as to surround the cathode bar 3, and causes direct-current plasma to be generated in a plasma generating space 4 formed between the cathode bar 3 and the anode cylinder 5; and a high-frequency induction plasma generating body 11 which is connected to the rear side of the anode cylinder 5 and causes high-frequency induction plasma to be generated in a plasma generating space 17 formed in a cylindrical member 12 wound by an induction coil 13. A gap 21 is formed between the anode cylinder 5 and the insulating flange 2 such that it is connected to the direct-current plasma generating space 4 and causes the plasma moving toward the central axis O of the direct-current plasma generating space 4 to mix with the plasma moving in the circumferential direction of the direct-current plasma generating space 4 so that the plasma in a fixed direction is flown into the direct-current plasma generating space 4.