PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK

PROBLEM TO BE SOLVED: To provide a pellicle for lithography capable of reducing deformation of a mask caused by deformation of a pellicle frame even if the pellicle is stuck to the mask; to provide a mounting method therefor; to provide a pellicle-equipped mask; and to provide the mask.SOLUTION: In the pellicle including a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and an adhesion layer for sealing the pellicle frame to the mask; the adhesion layer is provided on an inner peripheral face of the pellicle frame so as to be capable of adhering to a side face of a mask having a mask image on a front face.