MASK CLEANER DEVICE FOR DRY COMPLETE TYPE ORGANIC EL AND MASK CLEANING METHOD FOR THE SAME

PROBLEM TO BE SOLVED: To provide a mask cleaner device for organic EL and the method, in which a large-size mask is washable and there is no application due to physical and thermal causes to the mask and no load growth to circumstances.SOLUTION: The mask cleaner device for dry complete type organic...

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Bibliographische Detailangaben
Hauptverfasser: KATAOKA FUMIO, YUMIBA KENJI, KATAGIRI KENJI, KITANI YUKA, IZAKI MAKOTO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a mask cleaner device for organic EL and the method, in which a large-size mask is washable and there is no application due to physical and thermal causes to the mask and no load growth to circumstances.SOLUTION: The mask cleaner device for dry complete type organic EL for removing an organic substance adhering to a surface from a mask containing the organic substance adhering to the surface in a vapor deposition process comprises a laser cleaning apparatus (10) carrying out a laser cleaning, an oxygen ashing device (20) carrying out an ashing by an oxygen plasma, an EUV apparatus (30) irradiating the surface of the mask with an EUV, and an atmospheric-pressure plasma treatment apparatus (40) carrying out an atmospheric-pressure plasma treatment, each being arranged mutually adjacently, and at the same time, a conveying means (50) for conveying the mask being provided.