SUBSTRATE TREATMENT APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a technology which can reduce a variation of the quality of films formed on a plurality of semiconductor substrates to be treated in a lump by a substrate treatment apparatus.SOLUTION: In a preliminary step for heat treatment, a forming position (height) of each of t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	INOKUCHI YASUHIRO, TANIUCHI MASAMICHI, HIRANO MAKOTO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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