PROJECTION DEVICE

PROBLEM TO BE SOLVED: To provide a projection device capable of uniformizing the projection distribution of projection materials to a workpiece regardless of the supply amount of the projection materials into an impeller.SOLUTION: In the projection device, an opening shape of each projection hole 10...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HAKAMADA AKIYOSHI, YAMASHITA TETSUYA, HAMADA KENJI, YAMASHITA KENJI, KURATANI GORO
Format:	Patent
Sprache:	eng
Schlagworte:	ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL GRINDING PERFORMING OPERATIONS POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a projection device capable of uniformizing the projection distribution of projection materials to a workpiece regardless of the supply amount of the projection materials into an impeller.SOLUTION: In the projection device, an opening shape of each projection hole 10 of the impeller 5 is formed into a rectangular shape, and each projection hole 10 includes an adjusting mechanism 11 to adjust the opening area. As a result, the projection distribution of the projection materials 4 to the workpiece 5 can be uniformized regardless of the supply amount of the projection materials 4 into the impeller 5.