LITHOGRAPHIC APPARATUS AND METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a detector with high signal stability. SOLUTION: There is provided the lithographic apparatus equipped with: an illumination system for providing a beam of radiation; a support structure for supporting patterning device, the patterning...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER VEEN PAUL, STOLK ROLAND PIETER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a detector with high signal stability. SOLUTION: There is provided the lithographic apparatus equipped with: an illumination system for providing a beam of radiation; a support structure for supporting patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section; a substrate table for holding a substrate; and a detector configured to measure a property of the beam of radiation, the detector comprising first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal. COPYRIGHT: (C)2011,JPO&INPIT