PROXIMITY EXPOSURE APPARATUS, METHOD OF CONTROLLING STAGE TEMPERATURE OF THE SAME, AND METHOD OF MANUFACTURING DISPLAY PANEL SUBSTRATE

PROBLEM TO BE SOLVED: To carry out pattern baking with high accuracy by allowing a temperature change of a stage to be small, when driving the stage for moving a substrate by a linear motor, in a proximity exposure apparatus. SOLUTION: The proximity exposure apparatus includes a detector for detecti...

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Bibliographische Detailangaben
Hauptverfasser:	SATO TAKASATO, WATANABE HIROSHI, MINEGISHI MANABU, YAMAIE YUTA, EGI ICHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONVEYING DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HANDLING THIN OR FILAMENTARY MATERIAL HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PACKING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To carry out pattern baking with high accuracy by allowing a temperature change of a stage to be small, when driving the stage for moving a substrate by a linear motor, in a proximity exposure apparatus. SOLUTION: The proximity exposure apparatus includes a detector for detecting a stage temperature, and controller for controlling a linear motor. The controller drives the stage by the linear motor, if the detected temperature of the stage is less than a lower limit, while a mask 2 is held by a mask holder 20 and the substrate 1 is not mounted on a chuck 10 when starting to drive the device or during the driving thereof, and carries out a first running-in where the temperature of the stage is increased by heating the linear motor up to a reference value or more which is higher than the lower limit. The temperature change of the stage during the exposure becomes small even if the temperature of the stage is decreased to less than the lower limit prior to starting to drive the device or during the driving thereof, so that pattern baking can be done with high accuracy. COPYRIGHT: (C)2011,JPO&INPIT