SEMICONDUCTOR EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To reduce an effect on a production volume by minimizing a downtime of semiconductor exposure equipment without restarting the equipment as a whole when a process of application software is in an abnormal state, in the semiconductor exposure equipment. SOLUTION: When the proces...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: NISHIMAKI AKIYOSHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To reduce an effect on a production volume by minimizing a downtime of semiconductor exposure equipment without restarting the equipment as a whole when a process of application software is in an abnormal state, in the semiconductor exposure equipment. SOLUTION: When the process of the application software is in the abnormal state, the semiconductor exposure equipment restarts the process locally in consideration of a production process status. Furthermore, the semiconductor exposure equipment can also be adapted to a variable process constitution system by obtaining corresponding information that makes the process associated with a job as a process execution unit. COPYRIGHT: (C)2011,JPO&INPIT