DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To suppress the lowering of the productivity of a display device having a TFT of a bottom gate structure, and to suppress the deterioration of display characteristics. SOLUTION: The display device includes a display panel having a substrate where a plurality of thin film transi...

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1. Verfasser: WAKAGI MASATOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To suppress the lowering of the productivity of a display device having a TFT of a bottom gate structure, and to suppress the deterioration of display characteristics. SOLUTION: The display device includes a display panel having a substrate where a plurality of thin film transistors are formed where the thin film transistors have gate electrodes, gate insulating films, and semiconductor film are laminated in order on the substrate, a part or the whole of the source electrode and a part or the whole of the drain electrode are laminated on the semiconductor film with a contact film interposed, and the contact film is oxidized except at a part interposed between the semiconductor film and the source electrode, and a part interposed between the semiconductor film and the drain electrode, and respective contact films have curved surfaces with unevenness at opposite sides from surfaces coming into the semiconductor film, and also a minimum film thickness is ≤3 nm and a maximum film thickness is ≥4 nm. COPYRIGHT: (C)2011,JPO&INPIT