MATERIAL, DEVICE AND METHOD FOR FORMING PATTERN

PROBLEM TO BE SOLVED: To provide a pattern forming material which has a favorable melt viscosity at room temperature of a photosensitive composition, can suppress reduction in the sensitivity of a photosensitive layer, can smoothly release a protective film without leaving a peeling mark of the protective film when a laminate comprising the pattern forming material is formed on a substrate, can efficiently form a pattern and can obtain the pattern of high sensitivity and high definition, and to provide a pattern forming device including the pattern forming material and a pattern forming method using the pattern forming material. SOLUTION: The pattern forming material includes a support body and a photosensitive layer thereon. In the material, the photosensitive layer includes a photosensitive composition containing an alkali-soluble binder, a polymerizable monomer and a photopolymerization initiator; the photosensitive composition has a melt viscosity at 30-40°C of 1×104-1×107mPa s; and the minimum exposure dose with a laser beam at a wavelength of 405 nm, when a pattern thickness obtained by exposing and developing the photosensitive layer is 90% of the thickness of the layer prior to the exposure, is not more than 20 mJ/cm2. COPYRIGHT: (C)2011,JPO&INPIT