DEFECT REPAIR APPARATUS, AND METHOD FOR EUV MASK

PROBLEM TO BE SOLVED: To repair defects of an EUV mask without markedly deteriorating reflectance of a reflection layer in the EUV mask. SOLUTION: A defect repair apparatus for an EUV mask includes: an electric field ionization type ion source that generates a hydrogen ion beam; an ion optical syste...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OGAWA TAKASHI, YASAKA KOJIN, OBA HIROSHI, ARAMAKI BUNRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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