CHARGED PARTICLE BEAM MICROSCOPE

PROBLEM TO BE SOLVED: To provide a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. SOLUTION: The charged particle beam microscope acquires a plurality of frame images by scanning t...

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Bibliographische Detailangaben
Hauptverfasser:	HAYATA YASUNARI, TANAKA JUNICHI, OKAI NOBUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. SOLUTION: The charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308), and at the same time acquires pattern information (314) using a separated image (309, 310) composed of a single frame image comprising a frame image, a subframe image, and the like. COPYRIGHT: (C)2011,JPO&INPIT