EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE

PROBLEM TO BE SOLVED: To improve drawing quality by forming a pattern with less visible ruggedness of an edge and suppressing generation of moire. SOLUTION: A spatial optical modulator (DMD 25) of a light beam irradiation device 20 comprises a plurality of mirrors arrayed in two directions orthogona...

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Bibliographische Detailangaben
1. Verfasser:	MOCHIZUKI MASAAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:	PROBLEM TO BE SOLVED: To improve drawing quality by forming a pattern with less visible ruggedness of an edge and suppressing generation of moire. SOLUTION: A spatial optical modulator (DMD 25) of a light beam irradiation device 20 comprises a plurality of mirrors arrayed in two directions orthogonal to each other. A drawing control unit 71 supplies drawing data at the same position in an exposure region a plurality of times to a drive circuit (DMD drive circuit 27) of the light beam irradiation device 20, and supplies a part of the drawing data supplied a plurality of times as a drawing data at a position adjoining to the exposure region to the drive circuit (DMD drive circuit 27) of the light beam irradiation device 20. A part of the light beam projected from the light beam irradiation device 20 is shifted to the position adjoining to the exposure region, which blurs an edge of the drawn pattern and makes ruggedness of the edge less visible. Further, the regularity of repeated feature of the pattern is disturbed, which suppresses generation of moire. COPYRIGHT: (C)2011,JPO&INPIT