PELLICLE FOR LITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a pellicle for lithography that prevents distortion of a mask even when the pellicle is bonded to the mask. SOLUTION: The pellicle for lithography includes a membrane-bonding adhesive applied on one end face of a pellicle frame. A pellicle membrane is tensely bonded...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	SHIRASAKI SUSUMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pellicle for lithography that prevents distortion of a mask even when the pellicle is bonded to the mask. SOLUTION: The pellicle for lithography includes a membrane-bonding adhesive applied on one end face of a pellicle frame. A pellicle membrane is tensely bonded to the frame with the adhesive. A pressure-sensitive adhesive layer is provided on the other end face of the frame. The flatness of the surface of the membrane-bonding adhesive layer is not more than 10 μm. COPYRIGHT: (C)2011,JPO&INPIT