METHOD OF REMOVING CONTAMINATION FROM SUBSTRATE AND DEVICE

PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device. SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device,...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANTEN PETER FRANCISCUS, JANSEN HANS, ANTONIUS LEENDERS MARTINUS HENDRIKUS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, VAN DER GRAAF SANDRA, VAN DER DONCK JACQUES COR JOHAN, GROENEWOLD JAN, BRULS RICHARD JOSEPH, BOUCHOMS IGOR PETRUS MARIA, VAN DEN BOGAARD FREDERICK JOHANNES, VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS, ZOLDESI CARMEN JULIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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