METHOD OF REMOVING CONTAMINATION FROM SUBSTRATE AND DEVICE

PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device. SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device,...

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Bibliographische Detailangaben
Hauptverfasser:	WANTEN PETER FRANCISCUS, JANSEN HANS, ANTONIUS LEENDERS MARTINUS HENDRIKUS, DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS, VAN DER GRAAF SANDRA, VAN DER DONCK JACQUES COR JOHAN, GROENEWOLD JAN, BRULS RICHARD JOSEPH, BOUCHOMS IGOR PETRUS MARIA, VAN DEN BOGAARD FREDERICK JOHANNES, VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS, ZOLDESI CARMEN JULIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of removing contamination from an immersion hood and/or an immersion fluid in an immersion lithography device. SOLUTION: A cleaning substrate CW1 having a rigid support layer and a deformable layer provided on the rigid support layer is loaded in the device, the deformable layer 2 of the cleaning substrate CW1 is brought into contact with a surface of the device from which the contamination is removed, and a relative movement between the deformable layer 2 and the surface of the device from which the contamination is removed is introduced to remove the contamination separated from an immersion hood surface. COPYRIGHT: (C)2011,JPO&INPIT