LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a lithographic apparatus for preventing bubbles from entering a projection beam during image formation. SOLUTION: In a liquid confinement structure of an immersion lithographic apparatus, an elongate continuous opening forms an outlet for supplying liquid to a space...

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Bibliographische Detailangaben
Hauptverfasser:	SERGEI SHULEPOV, BARAGONA MARCO, CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN, MAIKEL ADRIANUS CORNELIS SCHEPERS, DIREKS DANIEL JOSEPH MARIA, PIETER MULDER, EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA, BESSEMS DAVID
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic apparatus for preventing bubbles from entering a projection beam during image formation. SOLUTION: In a liquid confinement structure of an immersion lithographic apparatus, an elongate continuous opening forms an outlet for supplying liquid to a space beneath a projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from an image field. COPYRIGHT: (C)2011,JPO&INPIT