LIGHT SOURCE OPTIMIZATION FOR IMAGE FIDELITY AND THROUGHPUT

PROBLEM TO BE SOLVED: To provide optimization of a light source suitable for image fidelity and throughput. SOLUTION: This method is used for optimizing a light source to generate a desired feature pattern on a wafer by photolithography processing. The method includes steps of: receiving at least a...

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Bibliographische Detailangaben

1. Verfasser:	GRANIK YURI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHIC PROCESSES OR APPARATUS HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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